Equipment

MPCVD production equipment

In-house microwave plasma CVD equipment covering 3" to 8" wafer capability, supporting scalable growth of single-crystal and polycrystalline diamond.

Capability · capability overview

In-house control from equipment to process

Equipment and process developed in lockstep; growth parameters feed directly into material specs and lot-consistency control.

01

In-house equipment

Chamber structure, microwave coupling, and thermal-field control are designed in-house and engineering-validated.

02

Process know-how

Growth windows for different sizes and thicknesses form a parameter library supporting stable spec reproduction.

03

Capacity coordination

Multiple tools run in parallel; line resources allocated flexibly to order specs.

Capacity and partnership inquiry

For equipment parameters, capacity planning, or cooperation models, please contact us.